The
sputter coating has a wide range of applications in different sectors such as medical, aerospace, automobile, optics, electronics, and energy for thin film deposition, etching of targets and surface treatments.
In this study, ceramic fabrics were functionalized using metal
sputter coatings.
Sputter Coating: Vacuum deposition process in which the coating material is knocked from a solid "target" atom by atom by means of ion bombardment.
We'll
sputter, but we can't do it the first five series.
The nonwoven samples were ultrasonically cleaned in ethanol and distilled water before the
sputter coatings were applied.
The problem with such materials is that they inevitably contain internal surface areas and voids that increase the out-gassing of adsorbed impurities and sometimes also result in ejection of poorly bonded macroparticles that break loose upon being uncovered by
sputter erosion.
And, while any such
sputter begins in America's sports arenas and on its couches, it quickly spreads to Madison Avenue, forcing the NBA's power brokers to address issues about the game's integrity and marketability.
Keywords Magnetron
sputter coating, Nanostructure, Silver, AFM, Antibacterial properties, Electrical conductivity
About Apollo/Stratus Product Families: The Apollo advanced
sputter deposition system incorporates multi-wafer processing commonly used in cluster tools while avoiding the disadvantages of central handling.
TABLE 164 GLOBAL FORECAST--OPTICAL COATINGS:
SPUTTER COATED AREA BY APPLICATION, THROUGH 2012 (MILLION M2)
The system should consist of 5-6 sample holder positions for
sputter deposition including 4 single 3 inch magnetron guns with 4 DC + 2 RF power supplies and 1 confocal cluster with 4 magnetrons for 2 inch targets each, with 4 DC and 2 RF power supplies, one optional spare deposition position for later upgrades.
Specimens are
sputter etched from both sides by the two ion guns at 1-15mu m/hr, depending on the materials, down to a thickness of 50 nm or less.
Specimens are
sputter etched from both sides by the two ion guns at 1-15 [[micro]meter]/hr, depending on the materials, down to a thickness of 50 nm or less.
Contract notice for supply of gold targets for cpi
sputter systems.
DC voltages are generally used for sputtering metals, but cannot be used to
sputter nonconducting targets because of charge accumulation at the target surface.
